| abstract |
A ceramic material is provided for extending the useful life of a component of a semiconductor processing apparatus exposed to plasma. The components of the semiconductor processing apparatus are at least partially formed of a ceramic material that is resistant to erosion, corrosion and / or corrosion-erosion. Exemplary ceramic materials may include at least one of hafnium, strontium, lanthanum oxide and / or dysprosium oxides, nitrides, borides, carbides and / or fluorides. The ceramic material can be applied as a coating over the substrate to form a composite component or formed as a monolithic body. The coating can protect the substrate from physical and / or chemical attack. [Selection] Figure 2 |