abstract |
A novel compound useful as an acid generator for a resist composition, an acid generator comprising the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition To provide. A resist composition comprising: a base material component (A) whose solubility in an alkali developer is changed by the action of an acid; and an acid generator component (B) that generates an acid upon exposure. The generator component (B) has the general formula (I) [wherein R 5 is a hydrogen atom or an organic group having 1 to 30 carbon atoms which may have a substituent, and Q 5 is a single bond or 2 Valent linking group. ] The acid composition (B1) which consists of a compound which has group represented by this in the cation part is included, The resist composition characterized by the above-mentioned. [Chemical 1] [Selection figure] None |