| abstract |
A photoacid generator, a copolymer containing the photoacid generator, a chemically amplified resist composition containing the copolymer, and a pattern forming method using the chemically amplified resist composition are provided. A photoacid generator is linked to the main chain of a copolymer. Thereby, a photo-acid generator can be uniformly disperse | distributed in a resist film, and the line edge illuminance characteristic etc. of a resist pattern can be improved. [Selection] Figure 5 |