http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010114471-A

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filingDate 2010-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_081f9ee0e1f0d414ce03e1de08844875
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publicationDate 2010-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010114471-A
titleOfInvention Method and apparatus for reducing arc during plasma processing
abstract An improved method and apparatus is provided for reducing arcing during plasma processing. In a first aspect, a method for use during plasma processing is provided. The first method includes: (1) placing a substrate on a substrate holder in a plasma chamber; (2) positioning a cover frame below near the periphery of the substrate; (3) plasma using the cover frame. Reducing arcs during plasma processing in the chamber. Numerous other aspects are provided. [Selection] Figure 3
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013161839-A
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