| abstract |
Resist composition for immersion exposure excellent in solubility of resist material, resist pattern forming method using the resist composition for immersion exposure, and additive useful for the resist composition for immersion exposure To provide a fluorine-containing compound. A base material component (A) whose solubility in an alkali developer is changed by the action of an acid, an acid generator component (B) that generates an acid upon exposure, and a fluororesin component (F) are mixed with an organic solvent (S). The fluorine-containing resin component (F) comprises a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a tertiary alkyl group. A resist composition for immersion exposure, comprising a structural unit (f3) derived from an acrylate ester containing a containing group or an alkoxyalkyl group. [Selection figure] None |