| abstract |
The present invention provides a resist underlayer film forming composition capable of forming a resist underlayer film having good matching characteristics with a resist film. A resist underlayer film forming composition according to the present invention comprises a siloxane polymer component having a repeating unit represented by the following general formula (1). (In the formula (1), R 1 is a hydrogen atom or a monovalent organic group, R 2 is a monovalent organic group having an electron-withdrawing group. Multiple in repeated R 1 s or R 2 And may be different from each other, a is 0 or 1.) [Selection] Figure 1 |