| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2008-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_234f320334f9a97fe9e39a3fe7148a86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_926b08cd2f1681877250ba029f56b2fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11d08fb1bdc2dabc32da488e630b19c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d64e959480527574d8965bbe2262bc39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b81b1c5a5d52d3acb14f3fa5d54f296c |
| publicationDate |
2010-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010020173-A |
| titleOfInvention |
Chemically amplified positive resist composition and pattern forming method |
| abstract |
Lithography technology using a photoresist is required to obtain very high temporal stability. In addition, a good pattern profile and high resolution independent of the substrate must be obtained. The present invention provides a chemically amplified positive resist composition that can simultaneously solve these problems, a method of forming a resist pattern using the same, and a method of manufacturing a photomask blank. An alkali resist comprising a chemically amplified resist compound containing one or more monomer units represented by the following general formula (1) and the like, wherein a part of the hydroxyl group of the polymer is protected by an acetal group: A chemically amplified positive resist composition containing an insoluble polymer, a base polymer that becomes alkali-soluble when deprotected by an acid catalyst, a triarylsulfonium salt containing a sulfonate anion, a basic component, and an organic solvent as main components object. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102221783-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8563216-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2410379-A2 |
| priorityDate |
2008-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |