http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010017841-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
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filingDate 2009-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_606646591b946417aad81333af6c98ad
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publicationDate 2010-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010017841-A
titleOfInvention Abrasive for synthetic quartz glass substrate
abstract A polishing agent for a synthetic quartz glass substrate comprising a colloid solution and a polycarboxylic acid polymer, wherein the colloid concentration is 20 to 50% by mass. According to the present invention, a high-sensitivity defect inspection apparatus for a synthetic quartz glass substrate surface in the production of synthetic quartz glass such as a synthetic quartz glass substrate for a photomask used in an optical lithography method important for the production of ICs and the like. The generation of defects detected in (1) is suppressed, the yield is expected to be improved in semiconductor device manufacturing and the like, and the semiconductor industry is further refined. In addition, for a synthetic quartz glass substrate for a photomask having a thick end surface used for a display-related material, generation of defects in polishing can be suppressed and yield can be improved. [Selection figure] None
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