| abstract |
PROBLEM TO BE SOLVED: To provide a polishing composition capable of producing a high-quality polished surface free from surface defects while maintaining a high polishing rate. A polishing comprising water, abrasive grains, a polishing accelerator, and an ammonium salt of an organic acid or an inorganic acid, optionally containing a surface modifier, and not containing boehmite. Composition. [Selection figure] None |