http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010015079-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
filingDate | 2008-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d072f1629ca27adc6324af88e2d27d91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9a9c4596ed404a4ab04eef308be229b |
publicationDate | 2010-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2010015079-A |
titleOfInvention | Positive resist composition |
abstract | Provided is a positive resist composition with improved crack resistance while suppressing resist pattern shape deterioration, resolution degradation, and resist residue generation during development. A positive resist composition according to the present invention contains (A) an alkali-soluble novolak resin, (B) an alkali-soluble acrylic resin, and (C) a photosensitizing agent, and (B) the alkali-soluble acrylic resin is: It has (b1) structural unit represented by general formula (B-1), It is characterized by the above-mentioned. [In General Formula (1), R 1b represents a hydrogen atom or a methyl group, and R 2b represents a linear or branched alkyl group having 5 or more carbon atoms which may have a substituent. ] [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2400344-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9625812-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I485521-B |
priorityDate | 2008-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 308.