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filingDate 2006-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009510699-A
titleOfInvention Method and apparatus for measuring electrical parameters of plasma processing
abstract A sensor device (100) for measuring plasma processing parameters for processing a workpiece is provided. The sensor device (100) is supported on a base (115), an information processor (130) supported on or in the base (115), and a bus (115) or in the bus (115). And at least one sensor (120). The at least one sensor (120) includes at least one sensing element (120A) configured to measure an electrical property of the plasma and at least one transducer (120B) coupled to the at least one sensing element (120A). Including. The converter (120B) is configured to receive a signal from the sensing element (120A) and convert the signal into a second signal for input to the information processor (130).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017111073-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101813308-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009535855-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012226930-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019506008-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014029860-A
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Total number of triples: 35.