http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009503882-A

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00547
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
filingDate 2006-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009503882-A
titleOfInvention Substrate processing method
abstract The present invention is a method for treating a substrate, (A) a periodic process comprising an etching step using a reactive etching gas in a chamber and a deposition step for depositing a protective polymer on the sidewalls of the portion of the structure already etched by the preceding etching step. Using to etch a structure generally perpendicular to the substrate, and (b) in the absence of the substrate, cleaning the chamber in which the material has been deposited by performing the deposition step in step (a); Following cleaning of the material derived from the deposition, the chamber is cleaned by removing the material from the etchant gas by exposing the chamber to a plasma comprising a mixture of O 2 and at least an active element of the etchant gas. This is a substrate processing method.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020137528-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015018876-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020137527-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020129626-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7359159-B2
priorityDate 2005-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003243360-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0555184-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457280508

Total number of triples: 22.