http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009503271-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate | 2006-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009503271-A |
| titleOfInvention | CVD / PECVD-remote chamber method using sulfur fluoride to remove surface deposits from inside a plasma chamber |
| abstract | The present invention relates to an improved remote plasma cleaning method for removing surface deposits from a surface, such as the interior of a process chamber used to manufacture electronic devices. The improvement includes the addition of a nitrogen source to a feed gas mixture comprising an oxygen source and sulfur fluoride. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011054909-A |
| priorityDate | 2005-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.