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filingDate 2009-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce8d2c69ee768a90ffc1fe8ce9241c03
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publicationDate 2009-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009287006-A
titleOfInvention Coating liquid for forming silica-based coating, method for forming low-dielectric-constant silica-based coating, and low-dielectric-constant silica-based coating obtained from the method
abstract PROBLEM TO BE SOLVED: To provide a coating liquid for forming a silica-based film containing nano-sized silica fine particles, a method for forming a low dielectric constant silica-based film on a substrate using the coating liquid, and a low temperature obtained from the method. It relates to a dielectric constant silica-based coating. SOLUTION: Formation of a silica-based film containing at least zeolite crystal nano-sized silica fine particles and tetraalkylammonium hydroxide (TAAOH) substantially free of impurities composed of at least an alkali metal element compound and a halogen group element compound A low dielectric constant silica-based coating film that has a low dielectric constant silica-based coating method using a coating liquid and superheated steam, and has low leakage current and also has heat resistance and moisture resistance. [Selection figure] None
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