http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009277720-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd83260a96356882b5f50dd097411a72 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-944 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2008-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_784d489c087c544df4ea84cedce913f8 |
| publicationDate | 2009-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009277720-A |
| titleOfInvention | Semiconductor device manufacturing method and etching apparatus |
| abstract | [PROBLEMS] To prevent the peripheral edge of a layer to be etched from being roughened in a process of removing a hard mask. An etching apparatus according to the present invention includes a reaction chamber, an electrode, a stage, and a shadow ring. An etching gas is introduced into the reaction chamber 10. The electrode 20 is disposed in the reaction chamber and is used for generating plasma by ionizing the etching gas. The stage 30 is disposed in the reaction chamber 10 and the substrate 50 is placed thereon. The shadow ring 40 is disposed in the reaction chamber 10 and is located above the stage 30. The shadow ring 40 covers the peripheral portion of the substrate 50 and the region inside thereof in a non-contact manner. The shadow ring 40 has an uneven pattern on the inner peripheral side. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014204062-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102102308-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190107379-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019142556-A1 |
| priorityDate | 2008-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426098968 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327157 |
Total number of triples: 19.