http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009251327-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2008-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77fba7dc6888e520ca0801fd3941ee20 |
publicationDate | 2009-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2009251327-A |
titleOfInvention | Positive photosensitive resin composition |
abstract | A photosensitive resin composition capable of forming a high-definition pattern is provided. Such a photosensitive resin composition is a positive photosensitive resin composition containing an alkali-soluble resin (A), a quinonediazide group-containing compound (B), and a fluorine-based liquid repellent material (C). Here, the fluorine-based liquid repellent material (C) is preferably a polymer obtained by polymerizing an ethylenically unsaturated group-containing fluorine-based monomer. More preferably, the fluorine-based liquid repellent material (C) is a copolymer obtained by polymerizing an ethylenically unsaturated group-containing monomer (c2) further having an epoxy group. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012118354-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016040577-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140134662-A |
priorityDate | 2008-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 228.