http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009245580-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fb9f44db08d1c42a53f3d28eaae416f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 |
| filingDate | 2009-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ebb053429fba41535ee660daf9d9e86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b2f8e7e8e7ebfb1a34fbe81c474b220 |
| publicationDate | 2009-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009245580-A |
| titleOfInvention | Polishing liquid composition |
| abstract | A polishing composition which has little residue on the polishing substrate after polishing of abrasive grains and polishing residue generated in polishing, has a high polishing rate, and can maintain the smoothness of the substrate, and the polishing liquid A method for manufacturing a substrate using the composition is provided. A polishing pad comprising an organic nitrogen compound having two or more amino groups and / or imino groups in the molecule, an organic polybasic acid, an abrasive, and water is supplied to a substrate, and a polishing pad is provided. A method for manufacturing a substrate for a hard disk, comprising the step of polishing the substrate using [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012000734-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013089262-A |
| priorityDate | 2009-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.