Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2008-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bea788b3a7c9526a431de5b6b05087bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be3b50d12ee62ba668565a14d0d19b1e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b3df795b995f217253365f1a058ba26 |
publicationDate |
2009-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2009244352-A |
titleOfInvention |
Resist composition and resist pattern forming method |
abstract |
A resist composition and a resist pattern forming method capable of forming a resist pattern having a good shape are provided. A resist composition comprising a base material component (A) whose solubility in an alkali developer is changed by the action of an acid, and an acid generator component (B) that generates an acid upon exposure, the resist composition comprising: The generator component (B) is an acid generator (B1) having an anion moiety represented by the following general formula (Ia) and an acid generator (B2) having a cation moiety represented by the following general formula (IIb) (However, the acid generator (B1) and the acid generator (B2) are different from each other). [Chemical 1] [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011028231-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011118123-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011112944-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220029218-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11150554-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012220570-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012308931-A1 |
priorityDate |
2008-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |