http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009222733-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-12 |
| filingDate | 2008-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9b7659e4f1096a9a49b4adbadc13d0b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71eec3538d3f8a70fe3567f5a95c2e40 |
| publicationDate | 2009-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009222733-A |
| titleOfInvention | Photoresist containing novolac resin blend |
| abstract | It is desirable to have a novel photoresist composition. It is particularly desirable to have a novel photoresist that exhibits excellent dissolution rate and photospeed properties. A photoresist composition comprising a radiation sensitive component and at least two different novolac resins is provided. In one aspect, the photoresists of the present invention exhibit a significantly higher dissolution rate, such as greater than 800 angstroms per second in an aqueous developer solution. In another aspect, the photoresist of the present invention can exhibit good photospeed, such as 100 mJ / cm 2 or less. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017126023-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014164303-A |
| priorityDate | 2008-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 83.