| abstract |
PROBLEM TO BE SOLVED: To provide sufficient properties of plating resistance, stability, flexibility, chemical resistance and resolution required as a permanent mask resist formed on a film-like substrate such as an FPC coverlay And a photosensitive resin composition that is particularly excellent in plating resistance and stability. (A) An epoxy acrylate obtained by reacting a resin obtained by reacting an epoxy resin (a1) with a vinyl group-containing monocarboxylic acid (a2) and a polybasic acid anhydride (a3). A compound, (B) an acrylic resin having a carboxyl group, (C) a guanamine compound represented by formula (1), and (D) a photopolymerizable compound having an ethylenically unsaturated group polymerizable in the molecule. A photosensitive resin composition comprising a compound, (E) a photopolymerization initiator, and (F) a thermosetting agent. Photosensitive film, permanent mask resist and method for producing permanent mask resist using the same. [Selection] Figure 1 |