| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4cfa2cd960871e68dc42686f585fc8d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_62ba4922d4578dfe4c14224f4bc940e0 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2008-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71803e943188b8e95274fb0330ac32fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae522c1706bd2c4f497b4f085fa1ebed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2acf9a2fd7e39eaa3474ae38b7998e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_146a1c2d84ef9b512719cde8859167ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5faed56dc0a02f4295ea373ca41c3735
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0eeb22232e9564c5ab2c4a21fa2addf2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e9a99da7d909fc8ca9011ab5fed1aba |
| publicationDate |
2009-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2009193992-A |
| titleOfInvention |
Substrate cleaning device with tilted plasma |
| abstract |
An object of the present invention is to provide a substrate cleaning apparatus capable of efficiently cleaning a portion to be cleaned by irradiating a substrate with helicon wave plasma from an oblique direction. The present invention relates to a plasma asher that introduces oxygen and water vapor into a decompressed vacuum chamber to generate plasma by high frequency, and strips the resist of the substrate held horizontally, and tilts the vacuum chamber to the substrate. On the other hand, the structure of the substrate cleaning apparatus is characterized in that the plasma is irradiated obliquely. [Selection] Figure 1 |
| priorityDate |
2008-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |