http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009158610-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d610873487d2bc9668c04d7c2ec8e6c |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate | 2007-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9563e1c66a4ded14637a70f1c2bc08af http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e254598b9af6fc75c8bc2d6a3f6041a5 |
publicationDate | 2009-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2009158610-A |
titleOfInvention | Insulation film damage recovery method |
abstract | [PROBLEMS] To recover a low dielectric constant insulating film that has been damaged by plasma by bringing it into contact with a recovery agent, so that the concentration of the recovery agent in the insulating film can be increased and the recovery process can proceed efficiently. A recovery processing method in which the characteristics of the subsequent insulating film are also improved is obtained. A substrate having an insulating film damaged by plasma processing is placed in a chamber, a recovery agent vapor is introduced into the chamber, and the inside of the chamber is heated to perform damage recovery processing on the insulating film. When performing, the temperature of the inner wall of the chamber 1 is set higher than the temperature of the substrate. The temperature of the chamber wall is preferably higher than the boiling point of the recovery agent, and it is also preferable to raise the temperature of the substrate 5 after introducing the recovery agent vapor into the chamber. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6991324-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020536389-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011166084-A |
priorityDate | 2007-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 75.