| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2007-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06a14aed8aac19bee97aeb122c11f235
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3d2775e254074423e1a7ec87c2cf6b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8462972f56f6057b4bbfc3e874aad1de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0598c69503276ea5d952467cb1095148
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72d8ac13b37f393663e811f5a07fe2b5 |
| publicationDate |
2009-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2009152304-A |
| titleOfInvention |
Plasma processing equipment |
| abstract |
An object of the present invention is to provide a plasma processing apparatus for measuring the etching amount of a material to be processed by light interference on the surface of a sample to be processed and determining the etching end point. The processing accuracy can be improved by accurate etching amount detection. A detector for detecting light from a surface of a sample to be processed through a shower plate in a plasma processing apparatus that generates plasma between the shower plate and a lower electrode to process the sample to be processed is light to which light is input. A light introduction unit comprising a transmission body and a spectroscope for analyzing the light obtained by the light introduction unit, and an end surface to which light from the light introduction unit is input is connected to the inside of the vacuum vessel from the end surface on the plasma side of the shower plate. Are arranged at a distance more than 5 times the mean free path of gas molecules. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10504703-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I620228-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8974628-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101966806-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190025772-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012049299-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113035680-A |
| priorityDate |
2007-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |