Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D295-08 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D295-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate |
2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_591d782423c75fb6247fc36b492019df http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d08bfbb914272a63018aee5ccc2bbb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f89cf3de44d48c2eb2654befcd951f3 |
publicationDate |
2009-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2009145871-A |
titleOfInvention |
Resist material and pattern forming method |
abstract |
A resist material containing one or more amine compounds represented by general formula (2). [Effects] The resist material of the present invention is highly effective in preventing resist film loss and has high resolution and focus margin expansion effects. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012208476-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013257552-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017044929-A |
priorityDate |
2000-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |