http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009139443-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2007-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3fd1bdd5334a22064e14dba6000ffb6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_321d114d76108c3dfde0d4c0b5877dde http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6815af2c2de7d447d16ff5fa12ee41ef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0af87f7f14f76735a6cd8f4c4a79a267 |
publicationDate | 2009-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2009139443-A |
titleOfInvention | Resist composition for immersion exposure and method for forming resist pattern |
abstract | A resist composition for immersion exposure with a small amount of substance elution with respect to an immersion solvent, particularly water, and a resist pattern forming method using the resist composition for immersion exposure are provided. A resist composition comprising a base material component (A) whose solubility in an alkaline developer is changed by the action of an acid, and an acid generator component (B) that generates an acid upon exposure, A resist composition for immersion exposure, wherein the 1-octanol / water partition coefficient of the cation component of the acid generator component (B) is 7.0 to 9.5. [Selection figure] None |
priorityDate | 2007-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 276.