| abstract |
Photosensitive composition used in semiconductor manufacturing process such as IC, circuit board such as liquid crystal and thermal head, and other photofabrication process, compound used in photosensitive composition, and photosensitivity A pattern forming method using the composition, wherein the pattern collapse is improved even in the formation of a fine pattern of 100 nm or less and a pattern having a good profile is formed, and a compound used in the photosensitive composition And a pattern forming method using the photosensitive composition. (A) A photosensitive composition containing an arylsulfonium salt compound having a polycyclic hydrocarbon structure in the cation moiety, a compound used in the photosensitive composition, and pattern formation using the photosensitive composition Method. [Selection figure] None |