Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32137 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
filingDate |
2008-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c84991025f0fcfd4cd141fce785fcae1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c63c0bd756fa180af4547ab7d7d03dc7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f7cab781b277b5ae8c195ede3357ea4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa9ed4faf7c193fcba07ee84fba606d3 |
publicationDate |
2009-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2009124109-A |
titleOfInvention |
Method to prevent bending and bending of etch profile in high aspect ratio opening by treatment of polymer formed on opening side wall |
abstract |
An etching method for forming a contact opening of a high aspect ratio in a dielectric layer is provided. A high-aspect-ratio contact opening is etched while a curved or bent etching profile is prevented by forming a thin film with high conductivity on the side wall of each contact opening. The conductivity of the thin film on the sidewall is enhanced by ion bombardment that occurs periodically during the etch process. [Selection] Figure 11 |
priorityDate |
2007-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |