http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009112944-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-04
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filingDate 2007-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bace66d200ca1b9d18eeade2625f9034
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publicationDate 2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009112944-A
titleOfInvention Ultrapure water manufacturing method and apparatus, and electronic component member cleaning method and apparatus
abstract An ultrapure water production apparatus capable of stably producing ultrapure water having a metal concentration of 0.1 ng / L or less, an ultrapure water production method using the same, a cleaning method for electronic parts, and the like A cleaning device is provided. In an ultrapure water production apparatus in which a mixed bed type deionization apparatus 16 having an anion exchange resin and a cation exchange resin is installed as a last stage deionization apparatus, a cation elution amount is previously obtained as the anion exchange resin. An anion exchange resin that has been analyzed and evaluated and confirmed to be below the specified value is used. The specified value is preferably 100 μg / L-anion exchange resin (wet state). [Selection] Figure 1
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Total number of triples: 44.