http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009105006-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
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filingDate 2007-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_029eef0ec25868fb216b90bb5a984f72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32d893f0cee5448826be63db927aea8d
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publicationDate 2009-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009105006-A
titleOfInvention EUV light emission method, and sensitive substrate exposure method using the EUV light
abstract The present invention provides a method of emitting EUV light at a low cost, which can obtain a higher conversion efficiency into EUV light than before by using a laser beam, can reduce the amount of debris generation than conventional ones. . A method of emitting EUV light by a double pulse irradiation method in which a target material is irradiated with a prepulse laser beam to generate plasma and then irradiated with a main pulse laser beam to emit EUV light. The material is made of at least one of tin and a tin compound, the ion density of plasma generated by irradiation with the prepulse laser beam is 1 × 10 16 to 1 × 10 19 cm −3 , and the main pulse laser beam is in the infrared region Of emitting EUV light, which is a laser beam. [Selection] Figure 1
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