http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009092979-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bfdf49224a405be1f7b653c56ebad94 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2007-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b47790e96f343a16ffab0eeea3508a11 |
publicationDate | 2009-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2009092979-A |
titleOfInvention | Resist removing composition and resist removing method using the same |
abstract | [PROBLEMS] An alkanolamine-based resist removal composition has insufficient resist removal capability, in particular, easily decomposes an organic solvent, and damages semiconductors and flat panel display materials. A resist removing composition comprising N- (cyanoalkyl) -N ′-(2-hydroxyalkyl) ethylenediamine has a high resist removing ability and does not decompose an organic solvent. There is no damage to the display material. As N- (cyanoalkyl) -N ′-(2-hydroxyalkyl) ethylenediamine, N- (cyanoalkyl) -N ′-(2-hydroxyethyl) ethylenediamine, (2-cyanoethyl) -N ′-(2- Hydroxyethyl) ethylenediamine, N- (2-methyl-2-cyanoethyl) -N ′-(2-hydroxyethyl) ethylenediamine and the like are preferable. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012118502-A |
priorityDate | 2007-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.