http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009092979-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2007-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b47790e96f343a16ffab0eeea3508a11
publicationDate 2009-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009092979-A
titleOfInvention Resist removing composition and resist removing method using the same
abstract [PROBLEMS] An alkanolamine-based resist removal composition has insufficient resist removal capability, in particular, easily decomposes an organic solvent, and damages semiconductors and flat panel display materials. A resist removing composition comprising N- (cyanoalkyl) -N ′-(2-hydroxyalkyl) ethylenediamine has a high resist removing ability and does not decompose an organic solvent. There is no damage to the display material. As N- (cyanoalkyl) -N ′-(2-hydroxyalkyl) ethylenediamine, N- (cyanoalkyl) -N ′-(2-hydroxyethyl) ethylenediamine, (2-cyanoethyl) -N ′-(2- Hydroxyethyl) ethylenediamine, N- (2-methyl-2-cyanoethyl) -N ′-(2-hydroxyethyl) ethylenediamine and the like are preferable. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012118502-A
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type http://data.epo.org/linked-data/def/patent/Publication

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