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publicationDate 2009-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009073710-A
titleOfInvention Method for manufacturing gallium nitride substrate, gallium nitride substrate and semiconductor device
abstract An object of the present invention is to form an orientation flat by suppressing the occurrence of cracking by an easy production method while ensuring a thickness and area that can be used for mass production. By removing a hard three-dimensional structure 14 having facets 15 from a gallium nitride crystal body 27 in parallel with a tangential line or the like, a gallium nitride substrate in which generation of chips and cracks is suppressed can be provided. Moreover, since the lines of the hard three-dimensional structure 14 having the facets 15 have a specific crystal orientation and are clear, the gallium nitride crystal cut and processed parallel to the lines of the three-dimensional structure 14 27 cutting lines 21 can be used for an orientation flat serving as a reference line for device processing. [Selection] Figure 1
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