http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008524852-A

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45563
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-507
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2005-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2008-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008524852-A
titleOfInvention Self-cooled gas distributor in high vacuum for high density plasma applications
abstract A gas distributor is provided for use in a semiconductor processing chamber. The gas distributor includes a gas inlet, a gas outlet, and a stem portion having a helical thread. The gas distributor further includes a body having a gas deflection surface extending radially outward from the stem portion, a lower surface disposed opposite the body from the gas deflection surface, and a helical thread and the gas deflection surface. A transverse sheet disposed therebetween, and a gas passage extending from the gas inlet through the stem portion and the main body to the gas outlet. In individual embodiments, the transverse sheet is adapted to hold a sealing member. [Selection] Figure 4
priorityDate 2004-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 24.