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publicationNumber JP-2008518482-A
titleOfInvention Novel method for cleaning ion implanter components
abstract A method and apparatus for cleaning residues from vacuum chamber and beamline components of ion implanters used in the manufacture of microelectronic devices. In order to effectively remove the residue, the component is contacted with the gas phase reactive halide composition for a time and under conditions sufficient to at least partially remove the residue. The gas phase reactive halide composition is selected so that it selectively reacts with the residue while not reacting with the components of the ion source region of the vacuum chamber.
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