| abstract |
An yttria insulator ring is provided for use in a plasma processing apparatus to minimize arcing between the apparatus and the ground extension and to increase the mean cleaning interval (MTBC). The yttria insulator ring can be placed between the edge ring and the ground extension, between the ground extension and the plasma generation area, or in the gap of the chamber of the device. Compared to the quartz ring, the yttria insulator ring improves RF coupling as a result of reduced reactivity and increased dielectric constant, thus improving the uniformity of the semiconductor substrate. [Selection] Figure 1A |