http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008505492-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F28D1-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F28D2021-0077 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F28F2013-006 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F25B29-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2005-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008505492-A |
| titleOfInvention | Apparatus and method for controlling inside of plasma processing apparatus to optimum temperature |
| abstract | An apparatus for controlling the temperature of the upper chamber of a plasma processing apparatus is disclosed. The temperature control device includes a heat conductor having an inner surface and an outer surface that are in heat transfer and movably connected to an upper chamber of the plasma processing apparatus. The temperature control device further includes at least one heating element and a plurality of thermal interface layers that are in thermal communication with the thermal conductor; connected to the thermal conductor and thermally coupled to the upper chamber of the plasma processing apparatus; A cooling element configured to conduct the fluid. The temperature control device includes at least one temperature sensor for detecting the temperature of the upper chamber of the plasma processing device; a temperature control unit for controlling the heating element and the cooling element; and a latch mechanism for fixing the temperature control device of the upper chamber. (Latching mechanism). [Selection] Figure 3A |
| priorityDate | 2004-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.