http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008304767-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2007-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9c3a26cf07e270a5d00a49ff32c1866 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ea00934073afcda034ea234b7bc3f6e |
| publicationDate | 2008-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008304767-A |
| titleOfInvention | Polymer for resist, resist composition, method for producing substrate on which pattern is formed, and polymerizable monomer |
| abstract | When used as a resist composition in DUV excimer laser lithography, etc., it has high sensitivity, high resolution, high light transmittance, few defects during development, and resistance to dry etching that can withstand resist film thinning A resist monomer having a resist, a resist polymer, a resist composition containing the resist polymer, and a method for producing a substrate on which a pattern using the resist composition is formed. A resist polymer containing a structural unit (A) having a naphthalene skeleton represented by the following formula (1-1). [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020100600-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013086460-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9636656-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021157354-A1 |
| priorityDate | 2007-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 234.