http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008169341-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2007-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_226b6375c16cb8d550353e4efd5fc7ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ea00934073afcda034ea234b7bc3f6e |
publicationDate | 2008-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2008169341-A |
titleOfInvention | Polymer, resist composition, and method for producing substrate on which pattern is formed |
abstract | When used in a resist composition such as DUV excimer laser lithography, the resist film is thinned with high sensitivity, high resolution, wide depth of focus margin, high light transmittance, few defects during development, and less defects. The present invention provides a polymer having a dry etching resistance capable of withstanding the above, a resist composition, and a method for manufacturing a substrate on which a pattern is formed. [Means for Solving the Problems] A resist polymer containing a structural unit (A) having a specific naphthalene skeleton, a resist composition, and a step of coating a resist composition on a substrate to form a resist film, exposed with light having a wavelength of 250 nm or less The manufacturing method of the board | substrate with which the pattern which has the process to develop and the process developed with a developing solution was formed. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008268920-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008304767-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009113228-A1 |
priorityDate | 2007-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 198.