| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-21 |
| filingDate |
2007-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e289ae0a9c33a16dbbce64424aaa6e4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90e7471636bcad01643299bafa38c47a |
| publicationDate |
2008-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008274365-A |
| titleOfInvention |
Si-containing film forming material, Si-containing film, method for producing the same, and semiconductor device |
| abstract |
The present invention provides a novel Si-containing film forming material, in particular, a low dielectric constant insulating film material containing a cyclic siloxane compound suitable for a plasma CVD apparatus, and a Si-containing film using the same and these films. An object of the present invention is to provide a semiconductor device. The following general formula (1) (In the formula, R represents a linear or branched alkyl group having 1 to 4 carbon atoms. N represents an integer of 3 to 5.) And a Si-containing film-forming material containing a vinyl group-containing cyclic siloxane compound represented by the formula: [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010153649-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014065699-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011192962-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013094421-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019245988-A1 |
| priorityDate |
2007-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |