| abstract |
A silicon dioxide precursor and a silicon dioxide precursor composition useful for forming a high-purity silicon dioxide film free from organic components are provided. The silicon dioxide precursor has the following formula (1) (H 2 SiO) n (HSiO 1.5 ) m (SiO 2 ) k (1) (in formula (1), n, m and k is a number, and when n + m + k = 1, n is 0.05 or more, m is more than 0 and 0.95 or less, and k is 0 to 0.2. , A silicone resin that is solid at 120 ° C. The silicon dioxide precursor composition contains the silicone resin and an organic solvent. [Selection] Figure 1 |