Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B3-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02348 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02351 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31695 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F30-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 |
filingDate |
2007-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85788026573123544dd302defdcdee6f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6960d19a093ee6b0fb86cdf2fc1acee1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80ba35ffb21f34a8b2d5fb41811d550f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a6f1025bf9cab2bf1565e2de058e734 |
publicationDate |
2008-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2008214487-A |
titleOfInvention |
Insulation film |
abstract |
An insulating material having an appropriate uniform thickness suitable for use as an interlayer insulating film in a semiconductor element device or the like, and having a low density, a low refractive index, and excellent film properties such as dielectric constant and Young's modulus. Providing a membrane. A semiconductor device obtained by curing a polymer compound obtained by polymerizing a cage silsesquioxane compound having two or more unsaturated groups as substituents and a siloxane structure having a cyclic structure on a substrate. The cage structure is characterized in that the cage structure is not broken by a curing reaction. Breakage of the cage structure can be detected by observing a peak near 610 cm −1 in the Raman spectrum of the film after the curing process. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I498344-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8530583-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010067683-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011084672-A |
priorityDate |
2007-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |