| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7acd9416af412b5972feb55a5e652ea2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-471 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-471
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32366
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 |
| filingDate |
2007-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9bb7034346b94fd41604bfd247b36dd9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc7b5c1feb8e485bd20c57f90a01dab3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4814399a756b7d6d8db96e9460e515e9 |
| publicationDate |
2008-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008205209-A |
| titleOfInvention |
Plasma processing equipment |
| abstract |
A plasma processing apparatus that can be manufactured at low cost and that can prevent unstable discharge and damage to an electrode is provided. The present invention relates to a plasma processing apparatus A for activating a plasma generating gas G by discharge and spraying the activated plasma generating gas G onto an object H to be processed. A conductive layer 2 is embedded in an insulating substrate 1 made of a ceramic sintered body to form a covered electrode 3. A plurality of coated electrodes 3, 3... Are arranged to face each other to form a space 4 between the coated electrodes 3, 3. A power source 5 is provided for applying a voltage to the conductive layer 2 to generate a discharge in the discharge space 4. Since the ceramic material is not sprayed, the cost of the material of the coated electrode 3 can be reduced and the manufacturing process can be simplified. Since the ceramic sintered body has a smaller porosity and is denser than a ceramic sprayed coating, dielectric breakdown is less likely to occur during discharge. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019075364-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011023244-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017010617-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020198235-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7189086-B2 |
| priorityDate |
2007-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |