| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32706 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2007-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c46051b2bc024a6a4dc9229664efa57e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4eb5121a7e864c6ae182ef8d0701ad43 |
| publicationDate |
2008-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008192906-A |
| titleOfInvention |
Plasma etching method, plasma etching apparatus, control program, and computer storage medium |
| abstract |
When an organic film is subjected to plasma etching through a mask made of a silicon-containing film formed thereon, it is possible to suppress the occurrence of bowing or undercut on the side wall portion of the organic film, which is favorable A plasma etching method and the like capable of obtaining a simple etching shape are provided. An organic film is etched by using a patterned SiON film as a mask to form an opening. For the plasma etching of the organic film 102, a processing gas composed of a mixed gas containing an oxygen (O) -containing gas, a rare gas, and a fluorocarbon gas (CF-based gas) is used. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014158005-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011134896-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101810970-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010004997-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8419960-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230057393-A |
| priorityDate |
2007-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |