| abstract |
The present invention provides a composition that is comprehensively excellent in photocurability, adhesion, releasability, remaining film properties, pattern shape, coatability (I), coatability (II), and etching suitability. At least one of (a) a cationic polymerizable monomer, (b) a photocationic polymerization initiator, (c) a fluorine-based surfactant, a silicone-based surfactant, and a fluorine / silicone-based surfactant. 0.001 to 5% by mass of the seed, and (d) the content of the organic solvent is 1% by mass or less, (e) the content of the coloring material is 0.5% by mass or less, and (a) A photocurable composition containing at least 10% by mass or more of a compound having an oxetane ring as a cationic polymerizable monomer. [Selection figure] None |