| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2007-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9fbb3868b832970980028799f9e6ec2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b90ed5673cb18ca2843cf8f1dd8af1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e63a38b83b7e62e74b7982d27f2b9d51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92e7710475420c56168894017da09be8 |
| publicationDate |
2008-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008170943-A |
| titleOfInvention |
Coating composition for photolithography |
| abstract |
A novel antireflective composition for use with an overcoated photoresist. An undercoating composition comprising one or more resins containing one or more modified imide groups is provided. These coating compositions are particularly useful as antireflective layers for overcoated photoresist layers. The preferred system is heat treated to increase the hydrophilicity of the composition coating layer and suppress unwanted mixing with the overcoated organic composition layer, while the composition coating layer is coated with an aqueous alkaline photoresist developer. It can be made removable. [Selection figure] None |
| priorityDate |
2006-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |