http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008153147-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2443 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2431 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2431 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2406 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2443 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2006-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c00cd88647b9066a1a48b60da652e68 |
| publicationDate | 2008-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008153147-A |
| titleOfInvention | Plasma processing equipment |
| abstract | To provide a plasma processing apparatus having a simple structure capable of processing a surface to be processed of a workpiece in a short time. A plasma processing apparatus includes a first electrode having a hollow portion that penetrates from an upper end to a lower end, a workpiece installation unit that installs a workpiece, and a first electrode that passes through the workpiece installation unit. 2, the second electrode 3 disposed to face the lower end of the hollow portion 40, the processing gas ejection portion 5 formed along the circumferential direction on the outer peripheral side of the opening 422 on the lower end side of the hollow portion 40, and the first electrode 2 A power supply circuit 7 having a power supply 72 for applying a voltage between the second electrode 3 and a gas supply means 8 for supplying a processing gas for generating plasma to the processing gas ejection section 5; By applying a voltage between the electrode 2 and the second electrode 3, the process gas ejected from the process gas ejection part 5 and activated in the vicinity of the opening 422 is activated to generate plasma, and the plasma generates a workpiece. 10 processed surfaces 101 are plasma-processed It is configured. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015032486-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017152624-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011228593-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010003321-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7331236-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101268644-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011132494-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010251163-A |
| priorityDate | 2006-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426105758 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11643 |
Total number of triples: 30.