http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008139789-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2006-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9 |
| publicationDate | 2008-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008139789-A |
| titleOfInvention | Upper layer film forming composition and photoresist pattern forming method using the same |
| abstract | An object of the present invention is to prevent intermixing with a photoresist film, to be able to maintain a stable coating that is difficult to elute in an immersion liquid, to suppress the occurrence of development peeling defects, and to form a high-resolution resist pattern. Provided is an upper film-forming composition for forming a formable upper film. A resin containing a repeating unit represented by the following general formula (1) (R 1 = hydrogen, methyl group, or trifluoromethyl group, R 2 = methylene group or ethylene group) is contained. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101329954-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010079231-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012219163-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009192784-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9261789-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011262859-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8501389-B2 |
| priorityDate | 2006-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 185.