http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008135296-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 |
| filingDate | 2006-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_094b69880b8dd90e7a35ba646ce014ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5f1ca9c6befd4c5a4293936a9979668 |
| publicationDate | 2008-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008135296-A |
| titleOfInvention | Plasma processing apparatus and surface treatment method |
| abstract | A plasma processing apparatus that captures foreign matter generated by plasma and prevents arc discharge, and a surface processing method for processing a surface to be processed of a workpiece using the plasma processing apparatus. A plasma processing apparatus includes a pair of electrodes that are movable relative to a workpiece, and a power source that applies a voltage between the pair of electrodes. A power supply circuit 7, a gas supply means 8 for supplying a processing gas for generating plasma between the pair of electrodes 2 and 3, and a plasma ejection part 5 for ejecting plasma toward the surface 101 of the workpiece 10. By applying a voltage while supplying the processing gas between the pair of electrodes 2 and 3, the processing gas is activated to generate plasma, and the processing target surface 101 of the workpiece 10 is processed by the plasma. In the plasma processing apparatus 1 configured as described above, a foreign matter trapping portion 9 made of a porous insulating material that traps the foreign matter 40 generated by the generation of plasma is disposed at or near the plasma ejection portion 5. Have. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015144225-A |
| priorityDate | 2006-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.