| abstract |
Planarizing film for TFT substrate and interlayer insulating film capable of obtaining a cured film having characteristics of high heat resistance, high transparency and low dielectric constant and capable of forming a pattern with a low exposure amount Alternatively, the present invention provides a photosensitive siloxane composition used for forming a core or a clad material of an optical waveguide. A photosensitive siloxane composition comprising (a) a polysiloxane, (b) a quinonediazide compound, and (c) a solvent, wherein the water content in the composition exceeds 2% by weight and is 10% by weight. % Photosensitive siloxane composition. [Selection figure] None |