| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b051f9f7933c758e66f6ceda5c9fb2cc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-264
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-261
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2007-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc27e5799435229a4ea9ae6bdcea95d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcfbf8572a96846705889c40c2530256 |
| publicationDate |
2008-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008103730-A |
| titleOfInvention |
Stripper containing acetal or ketal to remove post-etched photoresist, etching polymer and residue |
| abstract |
The present invention describes a formulation comprising an acetal or ketal as a solvent, water and a pH adjuster. These antifoams must have a pH of at least 7 or greater. The formulation in the present invention can optionally contain a water-soluble organic solvent as a co-solvent, a corrosion inhibitor and a fluoride. The formulation in the present invention can be used to remove not only polymeric residues but also post-etched organic and inorganic residues from the semiconductor substrate. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7291773-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015505886-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120127615-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013518179-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016513884-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010019978-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101664951-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010515107-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016163384-A1 |
| priorityDate |
2006-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |