http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008100473-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c389d310f52125a947b3408cb0cf3283 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-10 |
| filingDate | 2006-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16312e24d0f795aa9d2e422d649cfaf8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b334d71c1f5f117044b690befc692ad9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c6af24fdb8219411ad475d443dbcfb5 |
| publicationDate | 2008-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008100473-A |
| titleOfInvention | Manufacturing method of long polishing pad |
| abstract | PROBLEM TO BE SOLVED: To provide a method for producing a long polishing pad with high productivity which can prevent slurry leakage from between a polishing region and a light transmission region and has excellent optical detection accuracy. A process for preparing a cell-dispersed urethane composition by a mechanical foaming method, for forming a light transmission region having a transparent support film disposed in a long mold and having injection holes and injection walls at predetermined positions on the support film A step of disposing a mold, a step of discharging a light transmission region forming material into the injection hole, and curing the light transmission region formation material to form a light transmission region, on the transparent support film outside the injection hole Discharging the cell-dispersed urethane composition, curing the cell-dispersed urethane composition to form a polished region, and releasing the light-transmitting region forming mold and the long mold to form a light-transmitting region; A method for producing a long polishing pad, comprising a step of forming a long polishing layer having a gap with a polishing region. [Selection] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9050707-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008101089-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8409308-B2 |
| priorityDate | 2006-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 79.